Short Description
TOKAS International Creator Residency Program aims to invite distinguished and highly motivated international creators in the field of visual art, film, design, architecture, and to give opportunities to work in Tokyo.
The result of their residency will be presented at the OPEN STUDIO and/or the Result Presentation at TOKAS Hongo.
Residency Period: 3 months within the following residency periods
① from the beginning of May to the end of July, 2026
② from the beginning of September to the end of November, 2026
③ from the beginning of January to the end of March, 2027
Number of Creators: 6 creators (2 creators per period)
Eligibility
1. Resides outside of Japan
2. Has 5 years or more of experience in his/her specialized area of expertise
3. Has sufficient ability to communicate in English with other residing creators and TOKAS staff
for mutual understanding
4. Independent and capable of working and living on his/her own
5. Creators working as a duo are also eligible (A duo consisting of at least one creator residing
outside of Japan is eligible)
6. Students are ineligible (except for Ph.D. candidates)
Disciplines: Visual art, film, design, and architecture
Submission Requirements
① Able to stay consecutively at TOKAS Residency during the proposed residency period.
② Shall create the work to be presented at OPEN STUDIO and submit a comprehensive report
on the proposed project.
③ Participate in the Result Presentation held at TOKAS Hongo or other programs if asked by
TOKAS, and cooperates with its public relations activity.
④ Do not carry out any commercial or profitable activities throughout the residency period.
⑤ Do not conduct any activities that would make big noise or vibration in TOKAS Residency.
⑥ The accommodation is provided for the participating creator only. Family members, partners,
friends or guests are not permitted to stay at TOKAS Residency.
Application
① Application Form 1 and 2 (.pdf file): have to be filled in English.
② Two letters of recommendation (.pdf file): have to be prepared by two different referees (stated in “3) Referees” in Application Form 2) from art and cultural institutions, related educational organizations, or professionals specialized in the fields of art and culture.
*Letters must include signatures of the referees and the date of issue, written in either Japanese or English in A4 format
*Digital signature as well as hand-written signature will be accepted
*Please send the scanned PDF files of letters by June 25, 2025, 18:00 (JST)
③ Portfolio
Your portfolio should be no longer than 6 pages (A4, Landscape), including summaries of past activities, images of past projects, and links of videos or sounds. Please save it as one PDF file.
*The size of the portfolio file must be no larger than 10MB
*Please refer to Manual (.pdf file) for the details of instruction
*Please name the portfolio file as follows: Portfolio_YourNAME.pdf
*Any application which does not meet the requirements stated in the outline will not be accepted.
How to Apply
Please download Application Package from our website and read carefully through Manual (.pdf file). Please send your ① Application Form (1 and 2) and ② Two letters of recommendation mentioned in the Application to TOKAS Residency referring to apply_residency2026@tokyoartsandspace.jp for application by Email. Please write your name and “International Creator Residency Program 2026” on the subject line of your Emai
Program Benefits & Awards
- Living space (single room)
- Shared studio
- Airfare: A round-trip economy-class air ticket between the nearest airport from the place of residence and Tokyo (either Narita or Haneda Airport) will be provided
- Living expenses (per diem): JPY 4,200 (consumption tax excluded) per day
- Fee for work/project: JPY 300,000 (consumption tax excluded)
*Income tax (20.42%) will be deducted from the above amounts
*A twin-bedded room will be provided to creators applying as a duo
Entry Fee
None
Location
Tokyo, Japan
Timeline
- Application Deadline: 25 June 2025
Website Link: https://www.tokyoartsandspace.jp/en/archive/application/2025/20250513-305.html
